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Ruud E.I. Schropp, Miro Zeman's Amorphous and Microcrystalline Silicon Solar Cells: PDF

Posted On March 13, 2018 at 11:14 pm by / Comments Off on Ruud E.I. Schropp, Miro Zeman's Amorphous and Microcrystalline Silicon Solar Cells: PDF

By Ruud E.I. Schropp, Miro Zeman

ISBN-10: 0792383176

ISBN-13: 9780792383178

ISBN-10: 1061071251

ISBN-13: 9781061071253

ISBN-10: 1461556317

ISBN-13: 9781461556312

Amorphous silicon sun cellphone expertise has advanced significantly because the first amorphous silicon sun cells have been made at RCA Laboratories in 1974. Scien­ tists operating in a couple of laboratories world wide have constructed more desirable alloys in line with hydrogenated amorphous silicon and microcrystalline silicon. different scientists have built new tools for turning out to be those skinny motion pictures whereas but others have built new photovoltaic (PV) machine buildings with im­ proved conversion efficiencies. within the final years, a number of businesses have built multi-megawatt production crops which may produce large-area, multijunction amorphous silicon PV modules. an increasing number of humans be­ lieve that thin-film photovoltaics may be built-in into constructions on a wide scale within the following few many years and should manage to make a massive contribution to the world's power wishes. during this booklet, Ruud E. I. Schropp and Miro Zeman supply an authoritative review of the present prestige of skinny movie sun cells in line with amorphous and microcrystalline silicon. They assessment the numerous advancements that experience happened through the evolution of the know-how and in addition speak about the main im­ portant fresh recommendations within the deposition of the fabrics, the knowledge of the physics, and the fabrication and modeling of the devices.

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Extra resources for Amorphous and Microcrystalline Silicon Solar Cells: Modeling, Materials and Device Technology

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Sci. 70/71 (1993) 716-72l. , and M. Vanecek, A reduction in the Staebler- Wronski effect observed in low H content a-Si:H films deposited by the hot wire technique, AlP Conf. Proc. 234 (1991) 195-202. , J. P. Nelson, RS. Crandall, and I. Balberg, Deposition of device quality, low H content amorphous silicon, J. Appl. Phys. 69 (1991a) 6728-6730. P. Nelson, S. Salamon, and RS. Crandall, Deposition of device quality, low H content a-Si:H by the hot wire technique, J. Non-Cryst. Solids 137 & 138 (1991b) 657-660.

The layer-by-Iayer technique has been successful in terms of microcrystalline material quality, even at a very low hydrogen concentration. However, also in this technique the effective film fabrication rate (~ 1 A/s) is lower than in HWCVD. Typical materials properties of purely amorphous and purely polycrystalline intrinsic silicon films deposited at a high deposition rate utilizing HWCVD are discussed in Schropp et aL 1997. ) COOLING - . 45 GHz l' - . COOLING WATER A--t+---r-MAGNET COILS PLASMA CHAMBER --tt-\-T-f"il REACTION GAS (SiH4.

Lett. 72 (1998) 2397-2399. , M. Shima, A. Terakawa, M. Isomura, H. Haku, K. Wakisaka, M. Tanaka, S. Kiyama, and S. Tsuda, Effect of hydrogen dilution on a-Si/a-SiGe tandem solar cells, Proceedings of the 14th European Photovoltaic Solar Energy Conference, June 30 - July 4, Barcelona, Spain, Eds. A. Ossenbrink, P. Helm, and H. S. Stephens and Associates, 1997) p566-569. , Y. Toyoshima, A. Matsuda, and K. Ikuta, Substmte dependence of initial growth of microcrystalline silicon in plasma-enhanced chemical vapor deposition, J.

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